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Calculation of dielectric constant of porous SiCOH low-k films

dc.contributor.authorPalov, A.
dc.contributor.authorRakhimova, T
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T21:36:01Z
dc.date.available2021-10-22T21:36:01Z
dc.date.issued2015
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25725
dc.sourceIIOimport
dc.titleCalculation of dielectric constant of porous SiCOH low-k films
dc.typeJournal article
dc.contributor.imecauthorKrishtab, Mikhail
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage20603
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue2
dc.source.volume33
dc.identifier.urlhttp://scitation.aip.org/content/avs/journal/jvstb/33/2/10.1116/1.4906816
imec.availabilityPublished - open access


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