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Interaction of atomic fluorine with porous low-k SiCOH films: modeling

dc.contributor.authorPalov, A.
dc.contributor.authorVoronina, E.
dc.contributor.authorLopaev, D.
dc.contributor.authorMankelevich, Y.
dc.contributor.authorRakhimova, T.
dc.contributor.authorZyryanov, S.
dc.contributor.authorProshina, O.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T21:36:23Z
dc.date.available2021-10-22T21:36:23Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25726
dc.sourceIIOimport
dc.titleInteraction of atomic fluorine with porous low-k SiCOH films: modeling
dc.typeOral presentation
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference22nd International Symposium on Plasma Chemistry - ISPC
dc.source.conferencedate5/07/2015
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access
imec.internalnotesP-II-5-23


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