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EUV contact holes and pillars pattering

dc.contributor.authorPark, Sarohan
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorTao, Zheng
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorHyun, Yoonsuk
dc.contributor.authorKim, Seo-Min
dc.contributor.authorLim, Chang-Moon
dc.date.accessioned2021-10-22T21:39:51Z
dc.date.available2021-10-22T21:39:51Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25735
dc.sourceIIOimport
dc.titleEUV contact holes and pillars pattering
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewyes
dc.source.beginpage94220S
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VI
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2085920
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9422


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