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Phase formation and morphology of nickel silicide thin films synthesized by catalyzed chemical vapor reaction of nickel with silane

dc.contributor.authorPeter, Antony
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorRichard, Olivier
dc.contributor.authorMoussa, Alain
dc.contributor.authorSteenbergen, Johnny
dc.contributor.authorSchaekers, Marc
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-22T21:47:23Z
dc.date.available2021-10-22T21:47:23Z
dc.date.issued2015
dc.identifier.issn0897-4756
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25753
dc.sourceIIOimport
dc.titlePhase formation and morphology of nickel silicide thin films synthesized by catalyzed chemical vapor reaction of nickel with silane
dc.typeJournal article
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorSteenbergen, Johnny
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage245
dc.source.endpage254
dc.source.journalChemistry of Materials
dc.source.issue1
dc.source.volume27
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/cm503810p
imec.availabilityPublished - imec


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