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NXE:3300 insertion for N7 : status and challenges

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorMochi, Iacopo
dc.contributor.authorVan Look, Lieve
dc.contributor.authorLorusso, Gian
dc.contributor.authorLuong, Vu
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWittebrood, Friso
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorvan Setten, Eelco
dc.contributor.authorFliervoet, Timon
dc.contributor.authorDusa, Mircea
dc.date.accessioned2021-10-22T21:49:22Z
dc.date.available2021-10-22T21:49:22Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25758
dc.sourceIIOimport
dc.titleNXE:3300 insertion for N7 : status and challenges
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate5/10/2015
dc.source.conferencelocationMaastricht Netherlands
imec.availabilityPublished - imec


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