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Atomic layer deposition of ruthenium on ruthenium surfaces: a theoretical study

dc.contributor.authorPhung, Quan
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSwerts, Johan
dc.contributor.authorPierloot, Christine
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-22T21:50:14Z
dc.date.available2021-10-22T21:50:14Z
dc.date.issued2015
dc.identifier.issn1932-7447
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25760
dc.sourceIIOimport
dc.titleAtomic layer deposition of ruthenium on ruthenium surfaces: a theoretical study
dc.typeJournal article
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorPierloot, Christine
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.source.peerreviewyes
dc.source.beginpage6592
dc.source.endpage6603
dc.source.journalJournal of Physical Chemistry C
dc.source.issue12
dc.source.volume119
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/jp5125958
imec.availabilityPublished - imec


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