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Optical testing of EUV pellicle materials

dc.contributor.authorPollentier, Ivan
dc.contributor.authorVanpaemel, Johannes
dc.contributor.authorZahedmanesh, Houman
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorGallagher, Emily
dc.contributor.authorBrose, Sasha
dc.contributor.authorDanylyuk, Serhij
dc.contributor.authorBergmann, Klaus
dc.date.accessioned2021-10-22T21:53:26Z
dc.date.available2021-10-22T21:53:26Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25768
dc.sourceIIOimport
dc.titleOptical testing of EUV pellicle materials
dc.typeOral presentation
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorZahedmanesh, Houman
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Lithography
dc.source.conferencedate5/10/2015
dc.source.conferencelocationMaastricht The Netherlands
dc.identifier.urlhttp://euvlsymposium.lbl.gov/pdf/2015/Posters/P-MP-06_Pollentier.pdf
imec.availabilityPublished - open access


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