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Low-temperature pre-epitaxy surface cleaning of Si and SiGe

dc.contributor.authorProfijt, Harald
dc.contributor.authorSuhard, Samuel
dc.contributor.authorRosseel, Erik
dc.contributor.authorTolle, John
dc.contributor.authorMertens, Hans
dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorWeeks, Doran
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorLoo, Roger
dc.contributor.authorMehta, Sandeep
dc.contributor.authorMaes, Jan
dc.date.accessioned2021-10-22T21:56:38Z
dc.date.available2021-10-22T21:56:38Z
dc.date.issued2015-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25776
dc.sourceIIOimport
dc.titleLow-temperature pre-epitaxy surface cleaning of Si and SiGe
dc.typeMeeting abstract
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMaes, Jan
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewyes
dc.source.beginpage143
dc.source.endpage144
dc.source.conference9th International Conference on Silicon Epitaxy and Heterostructures - ICSI9
dc.source.conferencedate17/05/2015
dc.source.conferencelocationMontreal Canada
imec.availabilityPublished - imec


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