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Short- and damage-free process for patterning magnetic tunnel junctions for high-density application

dc.contributor.authorRadisic, Dunja
dc.contributor.authorSouriau, Laurent
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorGoossens, Danny
dc.contributor.authorYamashita, Fumiko
dc.contributor.authorKoizumi, Nao
dc.contributor.authorTahara, Shigeru
dc.contributor.authorNishimura, Eichi
dc.contributor.authorKim, Woojin
dc.contributor.authorDonadio, Gabriele Luca
dc.contributor.authorCrotti, Davide
dc.contributor.authorSwerts, Johan
dc.contributor.authorMertens, Sofie
dc.contributor.authorLin, Tsann
dc.contributor.authorCouet, Sebastien
dc.contributor.authorPiumi, Daniele
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorFurnemont, Arnaud
dc.date.accessioned2021-10-22T22:02:05Z
dc.date.available2021-10-22T22:02:05Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25789
dc.sourceIIOimport
dc.titleShort- and damage-free process for patterning magnetic tunnel junctions for high-density application
dc.typeMeeting abstract
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorKim, Woojin
dc.contributor.imecauthorDonadio, Gabriele Luca
dc.contributor.imecauthorCrotti, Davide
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorCouet, Sebastien
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorFurnemont, Arnaud
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecCouet, Sebastien::0000-0001-6436-9593
dc.contributor.orcidimecFurnemont, Arnaud::0000-0002-6378-1030
dc.source.peerreviewyes
dc.source.beginpagePS1-TuA12
dc.source.conferenceAVS 62nd International Symposium & Exhibition
dc.source.conferencedate18/10/2015
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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