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In situ X-ray diffraction study of the controlled oxidation and reduction in the V–O system for the synthesis of VO2 and V2O3 thin films

dc.contributor.authorRampelberg, Geert
dc.contributor.authorDe Schutter, Bob
dc.contributor.authorDe Vulder, Wouter
dc.contributor.authorMartens, Koen
dc.contributor.authorRadu, Iuliana
dc.contributor.authorDetavernier, Christophe
dc.date.accessioned2021-10-22T22:07:30Z
dc.date.available2021-10-22T22:07:30Z
dc.date.issued2015
dc.identifier.issn2050-7526
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25801
dc.sourceIIOimport
dc.titleIn situ X-ray diffraction study of the controlled oxidation and reduction in the V–O system for the synthesis of VO2 and V2O3 thin films
dc.typeJournal article
dc.contributor.imecauthorMartens, Koen
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecMartens, Koen::0000-0001-7135-5536
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewyes
dc.source.beginpage11357
dc.source.endpage11365
dc.source.journalJournal of Materials Chemistry C
dc.source.issue43
dc.source.volume3
dc.identifier.urlhttp://pubs.rsc.org/en/Content/ArticleLanding/2015/TC/C5TC02553B#!divAbstract
imec.availabilityPublished - imec


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