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Method for in-situ etch uniformity monitoring using plasma emission interferometry

dc.contributor.authorSamara, Vladimir
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorEconomou, Demetre
dc.date.accessioned2021-10-22T22:30:37Z
dc.date.available2021-10-22T22:30:37Z
dc.date.issued2015
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25856
dc.sourceIIOimport
dc.titleMethod for in-situ etch uniformity monitoring using plasma emission interferometry
dc.typeJournal article
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorEl Otell, Ziad
dc.source.peerreviewyes
dc.source.beginpage31206
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue3
dc.source.volume33
dc.identifier.urlhttp://scitation.aip.org/content/avs/journal/jvstb/33/3/10.1116/1.4917168
imec.availabilityPublished - imec


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