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193 nm lithography options: single layer, bilayer and TSI

dc.contributor.authorGoethals, Mieke
dc.date.accessioned2021-09-30T12:00:20Z
dc.date.available2021-09-30T12:00:20Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2586
dc.sourceIIOimport
dc.title193 nm lithography options: single layer, bilayer and TSI
dc.typeOral presentation
dc.source.peerreviewno
dc.source.conferenceArf Resists and Related Technologies: Satellite Meeting of the 15th Conference of Photopolymer Science and Technology; 29 June 1
dc.source.conferencelocation
imec.availabilityPublished - imec


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