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Actinic characterization of EUV photomasks by EUV scatterometry

dc.contributor.authorScholze, Frank
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorUllrich, A.
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorBurger, Sven
dc.date.accessioned2021-10-22T22:39:45Z
dc.date.available2021-10-22T22:39:45Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25877
dc.sourceIIOimport
dc.titleActinic characterization of EUV photomasks by EUV scatterometry
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferenceLithography Workshop
dc.source.conferencedate21/06/2015
dc.source.conferencelocationKetchum, ID USA
imec.availabilityPublished - imec


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