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Lithographic performance of 193 nm single and bi-layer materials

dc.contributor.authorGoethals, Mieke
dc.contributor.authorPollers, Ingrid
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorSugihara, Takashi
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorMedina, A.
dc.contributor.authorGabor, A.
dc.contributor.authorBlakeney, A.
dc.contributor.authorSteinhausler, T.
dc.contributor.authorBiafore, J.
dc.contributor.authorSlater, S.
dc.contributor.authorNalamasu, O.
dc.contributor.authorHoulihan, F.
dc.contributor.authorKometani, J.
dc.contributor.authorTimko, A.
dc.contributor.authorCirelli, R.
dc.date.accessioned2021-09-30T12:00:54Z
dc.date.available2021-09-30T12:00:54Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2588
dc.sourceIIOimport
dc.titleLithographic performance of 193 nm single and bi-layer materials
dc.typeJournal article
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan Driessche, Veerle
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage513
dc.source.endpage23
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue3
dc.source.volume11
imec.availabilityPublished - open access


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