Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes
dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Sugihara, Takashi | |
dc.contributor.author | Van den hove, Luc | |
dc.contributor.author | Vertommen, Johan | |
dc.contributor.author | Klippert, W. | |
dc.date.accessioned | 2021-09-30T12:01:09Z | |
dc.date.available | 2021-09-30T12:01:09Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2589 | |
dc.source | IIOimport | |
dc.title | Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes | |
dc.type | Journal article | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | Van den hove, Luc | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 3322 | |
dc.source.endpage | 3333 | |
dc.source.journal | Journal of Vacuum Science and Technology B | |
dc.source.issue | 6 | |
dc.source.volume | 12 | |
imec.availability | Published - open access |