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Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes

dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorSugihara, Takashi
dc.contributor.authorVan den hove, Luc
dc.contributor.authorVertommen, Johan
dc.contributor.authorKlippert, W.
dc.date.accessioned2021-09-30T12:01:09Z
dc.date.available2021-09-30T12:01:09Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2589
dc.sourceIIOimport
dc.titleDry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes
dc.typeJournal article
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorVan den hove, Luc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage3322
dc.source.endpage3333
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue6
dc.source.volume12
imec.availabilityPublished - imec


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