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The assessment of border traps in high-mobility channel materials

dc.contributor.authorSimoen, Eddy
dc.contributor.authorAlian, AliReza
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorLin, Dennis
dc.contributor.authorMertens, Hans
dc.contributor.authorMitard, Jerome
dc.contributor.authorSioncke, Sonja
dc.contributor.authorFang, Wen
dc.contributor.authorLuo, Jun
dc.contributor.authorZhao, Chao
dc.contributor.authorMocuta, Anda
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-22T22:52:53Z
dc.date.available2021-10-22T22:52:53Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25907
dc.sourceIIOimport
dc.titleThe assessment of border traps in high-mobility channel materials
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.source.peerreviewyes
dc.source.beginpage205
dc.source.endpage217
dc.source.conferenceSemiconductors, Dielectrics, and Metals for Nanoelectronics 13
dc.source.conferencedate11/10/2015
dc.source.conferencelocationPhoenix, AZ USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/69/5/205.short?cited-by=yes&legid=ecst;69/5/205
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 69, Issue 5


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