dc.contributor.author | Stokes, Harold | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Thouroude, Yan | |
dc.contributor.author | D'Urzo, Lucia | |
dc.contributor.author | Sayan, Safak | |
dc.contributor.author | Foubert, Philippe | |
dc.date.accessioned | 2021-10-22T23:10:26Z | |
dc.date.available | 2021-10-22T23:10:26Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25945 | |
dc.source | IIOimport | |
dc.title | Defectivity study on dry development rinse process (DDRP) | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Stokes, Harold | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Thouroude, Yan | |
dc.contributor.imecauthor | D'Urzo, Lucia | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.source.peerreview | yes | |
dc.source.conference | International Symposium on Extreme Ultraviolet Lithography - EUVL | |
dc.source.conferencedate | 5/10/2015 | |
dc.source.conferencelocation | Maastricht The Nederlands | |
imec.availability | Published - imec | |