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Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

dc.contributor.authorSun, Yiting
dc.contributor.authorLevrau, Elisabeth
dc.contributor.authorZhang, Liping
dc.contributor.authorGeypen, Jef
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorFranquet, Alexis
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBender, Hugo
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorDe Feyter, Steven
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-22T23:14:28Z
dc.date.available2021-10-22T23:14:28Z
dc.date.issued2015
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25953
dc.sourceIIOimport
dc.titleStuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
dc.typeJournal article
dc.contributor.imecauthorSun, Yiting
dc.contributor.imecauthorLevrau, Elisabeth
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorGeypen, Jef
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage70
dc.source.endpage74
dc.source.journalMicroelectronic Engineering
dc.source.volume137
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931714004572
imec.availabilityPublished - open access


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