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Free layer effective anisotropy thickness in high TMR top and bottom pinned perpendicular magnetic tunnel junctions

dc.contributor.authorSwerts, Johan
dc.contributor.authorMertens, Sofie
dc.contributor.authorLin, Tsann
dc.contributor.authorCouet, Sebastien
dc.contributor.authorTomczak, Yoann
dc.contributor.authorLiu, Enlong
dc.contributor.authorKim, Woojin
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorFurnemont, Arnaud
dc.date.accessioned2021-10-22T23:15:53Z
dc.date.available2021-10-22T23:15:53Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25956
dc.sourceIIOimport
dc.titleFree layer effective anisotropy thickness in high TMR top and bottom pinned perpendicular magnetic tunnel junctions
dc.typeMeeting abstract
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorCouet, Sebastien
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorKim, Woojin
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorFurnemont, Arnaud
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecCouet, Sebastien::0000-0001-6436-9593
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecFurnemont, Arnaud::0000-0002-6378-1030
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageWE.D.2_O3
dc.source.conferenceInternational Conference on Magnetism - ICM
dc.source.conferencedate5/07/2015
dc.source.conferencelocationBarcelona Spain
imec.availabilityPublished - open access


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