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A novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolation

dc.contributor.authorGrillaert, Joost
dc.contributor.authorHeylen, Nancy
dc.contributor.authorVrancken, Evi
dc.contributor.authorBadenes, Gonçal
dc.contributor.authorRooyackers, Rita
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-30T12:02:34Z
dc.date.available2021-09-30T12:02:34Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2595
dc.sourceIIOimport
dc.titleA novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolation
dc.typeProceedings paper
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorVrancken, Evi
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.beginpage313
dc.source.endpage318
dc.source.conferenceProceedings of the 3rd International Chemical-Mechanical-Planarization for ULSI Multilevel Interconnection Conference - CMP-MIC
dc.source.conferencelocation
imec.availabilityPublished - imec


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