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Constant voltage electromigration for advanced BEOL copper interconnects

dc.contributor.authorTang, Baojun
dc.contributor.authorCroes, Kristof
dc.contributor.authorJourdain, Anne
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorWilcox, Eric
dc.contributor.authorMcMullen, Timothy
dc.date.accessioned2021-10-22T23:26:43Z
dc.date.available2021-10-22T23:26:43Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25980
dc.sourceIIOimport
dc.titleConstant voltage electromigration for advanced BEOL copper interconnects
dc.typeProceedings paper
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorJourdain, Anne
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2D.6
dc.source.conferenceIEEE International Reliability Physics Symposium - IRPS
dc.source.conferencedate19/04/2015
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7112685
imec.availabilityPublished - open access


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