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Heterogeneous nano- to wide-scale co-integration of beyond-Si and Si CMOS devices to enhance future electronics

dc.contributor.authorThean, Aaron
dc.contributor.authorCollaert, Nadine
dc.contributor.authorRadu, Iuliana
dc.contributor.authorWaldron, Niamh
dc.contributor.authorMerckling, Clement
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorLoo, Roger
dc.contributor.authorMitard, Jerome
dc.contributor.authorRooyackers, Rita
dc.contributor.authorVandooren, Anne
dc.contributor.authorVerhulst, Anne
dc.contributor.authorVeloso, Anabela
dc.contributor.authorYakimets, Dmitry
dc.contributor.authorHuynh Bao, Trong
dc.contributor.authorChiappe, Daniele
dc.contributor.authorVaysset, Adrien
dc.contributor.authorZografos, Odysseas
dc.contributor.authorCaymax, Matty
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorBarla, Kathy
dc.contributor.authorSteegen, An
dc.date.accessioned2021-10-22T23:30:54Z
dc.date.available2021-10-22T23:30:54Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25989
dc.sourceIIOimport
dc.titleHeterogeneous nano- to wide-scale co-integration of beyond-Si and Si CMOS devices to enhance future electronics
dc.typeProceedings paper
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorVandooren, Anne
dc.contributor.imecauthorVerhulst, Anne
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorYakimets, Dmitry
dc.contributor.imecauthorZografos, Odysseas
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorBarla, Kathy
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecVandooren, Anne::0000-0002-2412-0176
dc.contributor.orcidimecVerhulst, Anne::0000-0002-3742-9017
dc.contributor.orcidimecZografos, Odysseas::0000-0002-9998-8009
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage3
dc.source.endpage14
dc.source.conferenceSilicon Compatible Materials, and Technologies for Advanced Integrated Processes, Circuits and Emerging Applications 5
dc.source.conferencedate29/06/2015
dc.source.conferencelocationChicago, IL USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/66/4/3.abstract
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 66, Issue 4


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