dc.contributor.author | Tillocher, T. | |
dc.contributor.author | Leroy, F. | |
dc.contributor.author | Zhang, Liping | |
dc.contributor.author | Lefaucheux, P. | |
dc.contributor.author | Yatsuda, K. | |
dc.contributor.author | Maekawa, K. | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Dussart, R. | |
dc.date.accessioned | 2021-10-22T23:33:49Z | |
dc.date.available | 2021-10-22T23:33:49Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25995 | |
dc.source | IIOimport | |
dc.title | Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Zhang, Liping | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | O-8-1 | |
dc.source.conference | 22nd International Symposium on Plasma Chemistry - ISPC | |
dc.source.conferencedate | 5/07/2015 | |
dc.source.conferencelocation | Antwerpen Belgium | |
imec.availability | Published - open access | |