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Experimental validation of novel mask technology to reduce mask 3D effects

dc.contributor.authorVan Look, Lieve
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorDavydova, Natalia
dc.contributor.authorWittebrood, Friso
dc.contributor.authorDe Kruif, Robert
dc.contributor.authorVan Oosten, Anton
dc.contributor.authorMiyazaki, Junji
dc.contributor.authorFliervoet, Timon
dc.contributor.authorVan Schoot, Jan
dc.contributor.authorNeumann, Jens Timo
dc.date.accessioned2021-10-23T00:15:21Z
dc.date.available2021-10-23T00:15:21Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26085
dc.sourceIIOimport
dc.titleExperimental validation of novel mask technology to reduce mask 3D effects
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewyes
dc.source.beginpage96350Z
dc.source.conferencePhotomask Technology 2015
dc.source.conferencedate29/09/2015
dc.source.conferencelocationWashington USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol 9635 (EMLC 2015 Best Paper Award)


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