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Patterning options for N7 logic : Prospects and challenges for EUV

dc.contributor.authorvan Setten, Eelco
dc.contributor.authorWittebrood, Friso
dc.contributor.authorPsara, Eleni
dc.contributor.authorvan Oorschot, Dorothe
dc.contributor.authorPhilipsen, Vicky
dc.date.accessioned2021-10-23T00:17:59Z
dc.date.available2021-10-23T00:17:59Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26090
dc.sourceIIOimport
dc.titlePatterning options for N7 logic : Prospects and challenges for EUV
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage96610G
dc.source.conference31st European Mask and Lithography Conference
dc.source.conferencedate22/06/2015
dc.source.conferencelocationEindhoven Netherlands
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2436945
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9661


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