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Thermal etching of metal thin films using supercritical fluid

dc.contributor.authorWatanabe, M.
dc.contributor.authorNakamura, Y.
dc.contributor.authorKondoh, E.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-23T00:55:54Z
dc.date.available2021-10-23T00:55:54Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26167
dc.sourceIIOimport
dc.titleThermal etching of metal thin films using supercritical fluid
dc.typeMeeting abstract
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpagen/a
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate27/04/2015
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttp://pesm-conference.org/files/2015_abstractbook.pdf
imec.availabilityPublished - open access


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