dc.contributor.author | Wen, Liang Gong | |
dc.contributor.author | Yamashita, Fumiko | |
dc.contributor.author | Tang, Baojun | |
dc.contributor.author | Croes, Kristof | |
dc.contributor.author | Tahara, Shigeru | |
dc.contributor.author | Shimoda, Keiichi | |
dc.contributor.author | Maeshiro, Takeru | |
dc.contributor.author | Nishimura, Eiichi | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Boemmels, Juergen | |
dc.contributor.author | Tokei, Zsolt | |
dc.date.accessioned | 2021-10-23T00:59:34Z | |
dc.date.available | 2021-10-23T00:59:34Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26174 | |
dc.source | IIOimport | |
dc.title | Direct etched Cu characterization for advanced interconnects | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Croes, Kristof | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.imecauthor | Boemmels, Juergen | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 173 | |
dc.source.endpage | 176 | |
dc.source.conference | IEEE International Interconnect Technology Conference - IITC / Materials for Advanced Metallization Conference - MAM | |
dc.source.conferencedate | 18/05/2015 | |
dc.source.conferencelocation | Grenoble France | |
dc.identifier.url | http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7325613 | |
imec.availability | Published - open access | |