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Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance
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Authors
Wostyn, Kurt
;
Rondas, Dirk
;
Loo, Roger
;
Dhayalan, Sathish Kumar
;
Hikavyy, Andriy
;
Elskens, Wim
;
Vyncke, Alex
;
Mertens, Paul
;
Holsteyns, Frank
;
De Gendt, Stefan
;
Masaoka, Toru
;
Yoshida, Yukifumi
;
Bast, Gerhard
;
Simpson, Gavin
Conference
E-MRS Fall Symposium: Alternative Semiconductor Integration in Si Microelectronics: Materials, Techniques and Applications
Title
Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance
Publication type
Meeting abstract
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