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Correlation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materials
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Correlation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materials
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wu, Chen
;
Li, Yunlong
;
Lesniewska, Alicja
;
Varela Pedreira, Olalla
;
de Marneffe, Jean-Francois
;
Ciofi, Ivan
;
Verdonck, Patrick
;
Baklanov, Mikhaïl
;
Boemmels, Juergen
;
De Wolf, Ingrid
;
Tokei, Zsolt
;
Croes, Kristof
Journal
Journal of Applied Physics
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1963
since deposited on 2021-10-23
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last month
Acq. date: 2025-12-12
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Metrics
Views
1963
since deposited on 2021-10-23
1
last month
Acq. date: 2025-12-12
Citations