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Correlation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materials

dc.contributor.authorWu, Chen
dc.contributor.authorLi, Yunlong
dc.contributor.authorLesniewska, Alicja
dc.contributor.authorVarela Pedreira, Olalla
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorCiofi, Ivan
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.date.accessioned2021-10-23T01:07:34Z
dc.date.available2021-10-23T01:07:34Z
dc.date.issued2015
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26189
dc.sourceIIOimport
dc.titleCorrelation between stress-induced leakage current and dielectric degradation in ultra-porous SiOCH low-k materials
dc.typeJournal article
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorLi, Yunlong
dc.contributor.imecauthorLesniewska, Alicja
dc.contributor.imecauthorVarela Pedreira, Olalla
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.contributor.orcidimecLesniewska, Alicja::0000-0003-3863-065X
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage164101
dc.source.journalJournal of Applied Physics
dc.source.volume118
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/jap/118/16/10.1063/1.4934520
imec.availabilityPublished - open access


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