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The impact of ALD TaN barrier processes on different BEOL utra low-k dielectrics

dc.contributor.authorZhang, Xunyuan
dc.contributor.authorGillot, Christophe
dc.contributor.authorZhao, Larry
dc.contributor.authorRyan, Todd
dc.contributor.authorWu, Chen
dc.date.accessioned2021-10-23T01:36:05Z
dc.date.available2021-10-23T01:36:05Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26244
dc.sourceIIOimport
dc.titleThe impact of ALD TaN barrier processes on different BEOL utra low-k dielectrics
dc.typeMeeting abstract
dc.contributor.imecauthorWu, Chen
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.source.peerreviewyes
dc.source.conferenceAVS Topical Conference on Atomic Layer Deposition
dc.source.conferencedate28/06/2015
dc.source.conferencelocationPortland, OR USA
imec.availabilityPublished - imec


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