Show simple item record

Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime

dc.contributor.authorZhang, Yu-Ru
dc.contributor.authorTinck, Stefan
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorWang, You-Nian
dc.contributor.authorBogaerts, Annemie
dc.date.accessioned2021-10-23T01:36:33Z
dc.date.available2021-10-23T01:36:33Z
dc.date.issued2015
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26245
dc.sourceIIOimport
dc.titleModeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime
dc.typeJournal article
dc.contributor.imecauthorDe Schepper, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage21310
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.issue2
dc.source.volume33
dc.identifier.urlhttp://scitation.aip.org/content/avs/journal/jvsta/33/2/10.1116/1.4906819
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
32245.pdf
Size:
2.078Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record