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Directed self-assembly of silicon-containing block copolymers for 20nm lithography

dc.contributor.authorBlachut, Gregory
dc.contributor.authorSirard, Stephen
dc.contributor.authorMaher, Michael
dc.contributor.authorAsano, Yusuke
dc.contributor.authorSomeya, Yasunobu
dc.contributor.authorLane, Austin
dc.contributor.authorDurand, William
dc.contributor.authorGronheid, Roel
dc.contributor.authorHymes, Diane
dc.contributor.authorEllison, Christopher
dc.contributor.authorWillson, Grant
dc.date.accessioned2021-10-23T10:07:55Z
dc.date.available2021-10-23T10:07:55Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26351
dc.sourceIIOimport
dc.titleDirected self-assembly of silicon-containing block copolymers for 20nm lithography
dc.typeOral presentation
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.conferenceSPIE Advanced Lithography Conference
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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