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Etch challenges for chemo-expitaxy Directed Self-Assembly (DSA) LiNe flow in Fin patterning

dc.contributor.authorChan, BT
dc.contributor.authorSayan, Safak
dc.contributor.authorMarzook, Taisir
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorGronheid, Roel
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorPiumi, Daniele
dc.date.accessioned2021-10-23T10:14:14Z
dc.date.available2021-10-23T10:14:14Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26416
dc.sourceIIOimport
dc.titleEtch challenges for chemo-expitaxy Directed Self-Assembly (DSA) LiNe flow in Fin patterning
dc.typeMeeting abstract
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate9/05/2016
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - open access


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