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Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorMao, Ming
dc.contributor.authorKocsis, Michael
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorYamashita, Fumiko
dc.contributor.authorStowers, Jason
dc.contributor.authorMeyers, Steven
dc.contributor.authorGrenville, Andrew
dc.contributor.authorLuong, Vinh
dc.contributor.authorParnell, Doni
dc.contributor.authorClark, Benjamin L.
dc.date.accessioned2021-10-23T10:28:13Z
dc.date.available2021-10-23T10:28:13Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26511
dc.sourceIIOimport
dc.titleDemonstration of an N7 integrated fab process for metal oxide EUV photoresist
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97760B
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505774
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9776


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