Show simple item record

Novel metal containing resists for EUV lithography extendibility

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSayan, Safak
dc.contributor.authorDei, Satoshi
dc.contributor.authorPollentier, Ivan
dc.contributor.authorKuwahara, Yuhei
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorNafus, Kathleen
dc.contributor.authorShiratani, Motohiro
dc.contributor.authorNakagawa, Hisashi
dc.contributor.authorNaruoka, Takehiko
dc.date.accessioned2021-10-23T10:28:34Z
dc.date.available2021-10-23T10:28:34Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26513
dc.sourceIIOimport
dc.titleNovel metal containing resists for EUV lithography extendibility
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorNaruoka, Takehiko
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage977606
dc.source.conferenceExtreme Ultravioelt (EUV) Lithography
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505770
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9776


Files in this item

Thumbnail
Name:
34347.pdf
Size:
1.313Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record