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dc.contributor.authorJonckheere, Rik
dc.contributor.authorRandall, John
dc.contributor.authorMarschner, Thomas
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-09-30T12:17:52Z
dc.date.available2021-09-30T12:17:52Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2657
dc.sourceIIOimport
dc.titleSome challenges for mask making to keep up with the roadmap
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage313
dc.source.endpage324
dc.source.conference18th Annual BACUS Symposium on Photomask Technology and Management
dc.source.conferencedate16/09/1998
dc.source.conferencelocationRedwood City, CA USA
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Vol. 3546


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