dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Randall, John | |
dc.contributor.author | Marschner, Thomas | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-09-30T12:17:52Z | |
dc.date.available | 2021-09-30T12:17:52Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2657 | |
dc.source | IIOimport | |
dc.title | Some challenges for mask making to keep up with the roadmap | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 313 | |
dc.source.endpage | 324 | |
dc.source.conference | 18th Annual BACUS Symposium on Photomask Technology and Management | |
dc.source.conferencedate | 16/09/1998 | |
dc.source.conferencelocation | Redwood City, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | SPIE Proceedings; Vol. 3546 | |