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Introducing the euv cnt pellicle

dc.contributor.authorGallagher, Emily
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorLee, Jae Uk
dc.contributor.authorPollentier, Ivan
dc.contributor.authorTimmermans, Marina
dc.contributor.authorZahedmanesh, Houman
dc.date.accessioned2021-10-23T10:54:22Z
dc.date.available2021-10-23T10:54:22Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26638
dc.sourceIIOimport
dc.titleIntroducing the euv cnt pellicle
dc.typeProceedings paper
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorTimmermans, Marina
dc.contributor.imecauthorZahedmanesh, Houman
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecTimmermans, Marina::0000-0001-9805-8259
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography -EUVL
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
imec.availabilityPublished - imec


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