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SU8 etch mask for patterning PDMS and its application to flexible fluidic microactuators

dc.contributor.authorGorissen, Benjamin
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorReynaerts, Dominiek
dc.contributor.authorDe Volder, Michael
dc.date.accessioned2021-10-23T10:59:11Z
dc.date.available2021-10-23T10:59:11Z
dc.date.issued2016
dc.identifier.issn2055-7434
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26658
dc.sourceIIOimport
dc.titleSU8 etch mask for patterning PDMS and its application to flexible fluidic microactuators
dc.typeJournal article
dc.contributor.imecauthorVan Hoof, Chris
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage16045
dc.source.journalMicrosystems & Nanoengineering
dc.source.volume2
dc.identifier.urlhttp://www.nature.com/articles/micronano201645
imec.availabilityPublished - open access


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