dc.contributor.author | Goux, Ludovic | |
dc.contributor.author | Belmonte, Attilio | |
dc.contributor.author | Celano, Umberto | |
dc.contributor.author | Woo, Jiyong | |
dc.contributor.author | Folkersma, Steven | |
dc.contributor.author | Chen, Michael | |
dc.contributor.author | Redolfi, Augusto | |
dc.contributor.author | Fantini, Andrea | |
dc.contributor.author | Degraeve, Robin | |
dc.contributor.author | Clima, Sergiu | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Jurczak, Gosia | |
dc.date.accessioned | 2021-10-23T10:59:28Z | |
dc.date.available | 2021-10-23T10:59:28Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26659 | |
dc.source | IIOimport | |
dc.title | Retention, disturb and variability improvements enabled by local chemical-potential tuning and controlled hour-glass filament shape in a novel W\WO3\Al2O3\Cu CBRAM | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Goux, Ludovic | |
dc.contributor.imecauthor | Belmonte, Attilio | |
dc.contributor.imecauthor | Celano, Umberto | |
dc.contributor.imecauthor | Folkersma, Steven | |
dc.contributor.imecauthor | Redolfi, Augusto | |
dc.contributor.imecauthor | Fantini, Andrea | |
dc.contributor.imecauthor | Degraeve, Robin | |
dc.contributor.imecauthor | Clima, Sergiu | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.imecauthor | Jurczak, Gosia | |
dc.contributor.orcidimec | Goux, Ludovic::0000-0002-1276-2278 | |
dc.contributor.orcidimec | Celano, Umberto::0000-0002-2856-3847 | |
dc.contributor.orcidimec | Clima, Sergiu::0000-0002-4044-9975 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1 | |
dc.source.endpage | 2 | |
dc.source.conference | IEEE Symposium on VLSI Technology | |
dc.source.conferencedate | 16/05/2016 | |
dc.source.conferencelocation | Honolulu, HI USA | |
dc.identifier.url | http://ieeexplore.ieee.org/document/7573404/ | |
imec.availability | Published - imec | |