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dc.contributor.authorGoux, Ludovic
dc.contributor.authorBelmonte, Attilio
dc.contributor.authorCelano, Umberto
dc.contributor.authorWoo, Jiyong
dc.contributor.authorFolkersma, Steven
dc.contributor.authorChen, Michael
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorFantini, Andrea
dc.contributor.authorDegraeve, Robin
dc.contributor.authorClima, Sergiu
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJurczak, Gosia
dc.date.accessioned2021-10-23T10:59:28Z
dc.date.available2021-10-23T10:59:28Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26659
dc.sourceIIOimport
dc.titleRetention, disturb and variability improvements enabled by local chemical-potential tuning and controlled hour-glass filament shape in a novel W\WO3\Al2O3\Cu CBRAM
dc.typeProceedings paper
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorBelmonte, Attilio
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorFolkersma, Steven
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage2
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate16/05/2016
dc.source.conferencelocationHonolulu, HI USA
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7573404/
imec.availabilityPublished - imec


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