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Characterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth

dc.contributor.authorKim, Young-Chang
dc.contributor.authorCaymax, Matty
dc.contributor.authorBender, Hugo
dc.contributor.authorVanhaelemeersch, Serge
dc.date.accessioned2021-09-30T12:20:10Z
dc.date.available2021-09-30T12:20:10Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2666
dc.sourceIIOimport
dc.titleCharacterization of the post dry etch cleaning of the silicon surface prior to silicon epitaxial growth
dc.typeOral presentation
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; Zie C3523


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