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Nucleation behaviour of PEALD WS2 on Al2O3 and SiO2

dc.contributor.authorGroven, Benjamin
dc.contributor.authorNalin Mehta, Ankit
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorBender, Hugo
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorRadu, Iuliana
dc.contributor.authorCaymax, Matty
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-23T11:02:27Z
dc.date.available2021-10-23T11:02:27Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26670
dc.sourceIIOimport
dc.titleNucleation behaviour of PEALD WS2 on Al2O3 and SiO2
dc.typeOral presentation
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorNalin Mehta, Ankit
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecNalin Mehta, Ankit::0000-0002-2169-940X
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewno
dc.source.conferenceWorkshop 'Atomic Layer Deposition for 2D Materials
dc.source.conferencedate31/10/2016
dc.source.conferencelocationEindhoven The Netherlands
imec.availabilityPublished - imec


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