dc.contributor.author | Gunay Demirkol, Anil | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Héraud, Stéphane | |
dc.contributor.author | Godny, Stephane | |
dc.contributor.author | Charley, Anne-Laure | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Urenski, Ronen | |
dc.contributor.author | Cohen, Oded | |
dc.contributor.author | Turovets, Igor | |
dc.contributor.author | Wolfling, Shay | |
dc.date.accessioned | 2021-10-23T11:03:11Z | |
dc.date.available | 2021-10-23T11:03:11Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26673 | |
dc.source | IIOimport | |
dc.title | Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 977807 | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXX | |
dc.source.conferencedate | 21/02/2016 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2507368 | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 9778 | |