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Study of design-based e-beam defect inspection for hotspot detection and process window characterization on 10nm logic device

dc.contributor.authorHalder, Sandip
dc.contributor.authorLeray, Philippe
dc.contributor.authorDi Lorenzo, Paolo
dc.contributor.authorWang, Fei
dc.contributor.authorZhang, Pengcheng
dc.contributor.authorFang, Wei
dc.contributor.authorLiu, Kevin
dc.contributor.authorJau, Jack
dc.date.accessioned2021-10-23T11:06:37Z
dc.date.available2021-10-23T11:06:37Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26687
dc.sourceIIOimport
dc.titleStudy of design-based e-beam defect inspection for hotspot detection and process window characterization on 10nm logic device
dc.typeProceedings paper
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97780O
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate20/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2502474
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9778


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