dc.contributor.author | Haslinger, Michael | |
dc.contributor.author | Soha, M. | |
dc.contributor.author | Robert, Sofie | |
dc.contributor.author | Claes, Martine | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | John, Joachim | |
dc.date.accessioned | 2021-10-23T11:09:12Z | |
dc.date.available | 2021-10-23T11:09:12Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26697 | |
dc.source | IIOimport | |
dc.title | 'Just-clean-enough': optimization of wet chemical cleaning processes for crystalline silicon solar cells | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Robert, Sofie | |
dc.contributor.imecauthor | Claes, Martine | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | John, Joachim | |
dc.source.peerreview | yes | |
dc.source.beginpage | 344 | |
dc.source.endpage | 347 | |
dc.source.conference | Ultra Clean Processing of Semiconductor Surfaces XIII - UCPSS | |
dc.source.conferencedate | 11/09/2016 | |
dc.source.conferencelocation | Knokke-Heist Belgium | |
imec.availability | Published - imec | |
imec.internalnotes | Solid State Phenomena; Vol. 255 | |