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Selective deposition of WS2 by a prepatterned dacrificial Si layer

dc.contributor.authorHeyne, Markus
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorRadu, Iuliana
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-23T11:15:43Z
dc.date.available2021-10-23T11:15:43Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26723
dc.sourceIIOimport
dc.titleSelective deposition of WS2 by a prepatterned dacrificial Si layer
dc.typeOral presentation
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceArea Selective Deposition Workshop
dc.source.conferencedate15/04/2016
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec


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