Show simple item record

Patterning challenges in advanced device architectures: FinFETs to nanowire

dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorMilenin, Alexey
dc.contributor.authorTao, Zheng
dc.contributor.authorHody, Hubert
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorVeloso, Anabela
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorWaldron, Niamh
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorKim, Min-Soo
dc.contributor.authorKikuchi, Yoshiaki
dc.contributor.authorMertens, Hans
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorPiumi, Daniele
dc.contributor.authorCollaert, Nadine
dc.contributor.authorBarla, Kathy
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-23T11:19:08Z
dc.date.available2021-10-23T11:19:08Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26735
dc.sourceIIOimport
dc.titlePatterning challenges in advanced device architectures: FinFETs to nanowire
dc.typeProceedings paper
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorHody, Hubert
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorKikuchi, Yoshiaki
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage978209
dc.source.conferenceAdvanced Etch Technology for Nanopatterning V
dc.source.conferencedate22/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2506645
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9782


Files in this item

Thumbnail
Name:
33660.pdf
Size:
902.1Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record