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Characterisation of HF-last cleaning of ion-implanted Si surfaces

dc.contributor.authorKondoh, Eiichi
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorJonckx, Franky
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-30T12:22:30Z
dc.date.available2021-09-30T12:22:30Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2675
dc.sourceIIOimport
dc.titleCharacterisation of HF-last cleaning of ion-implanted Si surfaces
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage107
dc.source.endpage117
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.issue2
dc.source.volume1
imec.availabilityPublished - open access


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