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SEM based overlay measurement between resist and buried patterns

dc.contributor.authorInoue, Osamu
dc.contributor.authorOkagawa, Yutaka
dc.contributor.authorHasumi, Kazuhisa
dc.contributor.authorShao, Chuanyu
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.contributor.authorLorusso, Gian
dc.contributor.authorBaudemprez, Bart
dc.date.accessioned2021-10-23T11:28:27Z
dc.date.available2021-10-23T11:28:27Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26767
dc.sourceIIOimport
dc.titleSEM based overlay measurement between resist and buried patterns
dc.typeProceedings paper
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage97781D
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXX
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2518881&resultClick=1
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9778


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