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Characterization of HF-last cleaning of ion-implanted Si surfaces

dc.contributor.authorKondoh, Eiichi
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-30T12:22:45Z
dc.date.available2021-09-30T12:22:45Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2676
dc.sourceIIOimport
dc.titleCharacterization of HF-last cleaning of ion-implanted Si surfaces
dc.typeOral presentation
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; Zie C3535


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